Plasma Impulse Chemical Vapour Deposition – A Coating Technique for Plastic Substrates

Plasma Impulse Chemical Vapor Deposition (PICVD) coating also known as Plasma Enhanced Chemical Vapor Deposition (PECVD) coating is vacuum controlled thin film deposition process carried out at low temperatures and is carried out in Plasma Impulse Chemical Vapor Deposition (PICVD) reactors. In Plasma Impulse Chemical Vapor Deposition (PICVD) process the carrier gas is reacted in the Plasma Impulse Chemical Vapor Deposition (PICVD) reactors and a plasma is created using electromagnetic waves, which is then deposited on the surface of substrate. It is mainly employed for surface coating process on polymer substrates where traditional CVD (Chemical Vapor Deposition) technology fails. Plasma Impulse Chemical Vapor Deposition (PICVD) coatings on the polymer substrates are anti-reflective, anti-scratch and easy to clean layers. The Plasma Impulse Chemical Vapor Deposition (PICVD) technology is mainly used in pharmaceutical and semi-conductor industry.

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The global Plasma Impulse Chemical Vapor Deposition (PICVD) market is primarily driven by the demand for advanced packaging system in the pharmaceutical industries. Furthermore, the drugs containing potent bio molecules like proteins need innovative packaging systems like Plasma Impulse Chemical Vapor Deposition (PICVD) due to its numerous advantages such as, low operating temperature, uniform coating distribution and high packing density. Pharmaceutical industry being the prominent end user for Plasma Impulse Chemical Vapor Deposition (PICVD) coating, overall growth in pharmaceutical market is anticipate to offer bolstering growth for Plasma Impulse Chemical Vapor Deposition (PICVD) market globally.

Apart from the pharmaceutical industry, the demand for Plasma Impulse Chemical Vapor Deposition (PICVD) in the decorative products and semi-conductor industry for coating of micro electronic systems is further augmenting the demand for Plasma Impulse Chemical Vapor Deposition (PICVD) market globally. On the plus side, macroeconomic factors such as, rise in disposable income of middle-class population has witnessed rise in consumer spending on consumer electronics, which in turn is propelling the growth of consumer electronics industry benefiting the global Plasma Impulse Chemical Vapor Deposition (PICVD) market.

Some notable trends in the Plasma Impulse Chemical Vapor Deposition (PICVD) market are the technological innovations and significant spending on developing the existing Plasma Impulse Chemical Vapor Deposition (PICVD) for instance, “SCHOTT AG” a leading market player in the Plasma Impulse Chemical Vapor Deposition (PICVD) market has developed Plasma Impulse Chemical Vapor Deposition (PICVD) process for deposition of three different functional layer coating on polymers. However, the high equipment cost of the Plasma Impulse Chemical Vapor Deposition (PICVD) coating equipment and use of toxic precursor gases such as silicon oxide and silicon nitride which forms toxic byproducts during reaction might hamper the growth of Plasma Impulse Chemical Vapor Deposition (PICVD) coatings market globally.

Some of the key players identified in the global Plasma Impulse Chemical Vapor Deposition (PICVD) Coating market includes SCHOTT AG, ENTEGRIS, INC, CALICO COATINGS, PVA TePla America., Manz AG IHI Hauzer Techno Coating B.V., PerformCoat, W&L Coating Systems GmbH and IHI Ionbond AG among others.